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[其他期刊] CO₂ Plasma Treatment To Prepare the Rear Emitter with a Boron-Doped Hydrogenated Amorphous/Nanocrystalline Silicon Stack for a High-Efficiency Silicon Heterojunction Solar Cell

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binghualing 发表于 2026-7-22 16:37:37 | 显示全部楼层 |阅读模式

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DOI号:10.1021/acsami.4c22110

文献链接:https://pubs.acs.org/doi/pdf/10.1021/acsami.4c22110

文献作者:

Lilan Wen
Lei Zhao*
Guanghong Wang
Xiaojie Jia
Xiaohua Xu
Xiaotong Li
Shiyu Qu
Xianyang Zhang
Yuhua Zuo*
Ke Xin
Xinyi Zhang
Zhigang Mei
Jihong Xiao
Su Zhou
Wenjing Wang

备注信息:CO₂ Plasma Treatment To Prepare the Rear Emitter with a Boron-Doped Hydrogenated Amorphous/Nanocrystalline Silicon Stack for a High-Efficiency Silicon Heterojunction Solar Cell

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[其他期刊] CO₂ Plasma Treatment To Prepare the Rear Emitter with a Boron-Doped Hydrogenated Amorphous/Nanocrystalline Silicon Stack for a High-Efficiency Silicon Heterojunction Solar Cell

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[其他期刊] CO₂ Plasma Treatment To Prepare the Rear Emitter with a Boron-Doped Hydrogenated Amorphous/Nanocrystalline Silicon Stack for a High-Efficiency Silicon Heterojunction Solar Cell