Large Pre-Trained Models and Few-Shot Fine-Tuning for Virtual Metrology: A Framework for Uncertainty-Driven Adaptive Process Control in Semiconductor Manufacturing

发表于 12 小时前

期刊：IEEE Transactions on Automation Science and Engineering

文献作者：Chin-Yi Lin; Tzu-Liang Tseng; Solayman Hossain Emon; Tsung-Han Tsai

出版日期：2025--

DOI号：10.1109/tase.2025.3568010

下载链接：https://ieeexplore.ieee.org/ielam/8856/10839176/10993365-aam.pdf

文献链接：https://doi.org/10.1109/tase.2025.3568010

当前文献来源于 Institute of Electrical and Electronics Engineers (IEEE)。

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[IEEE] Large Pre-Trained Models and Few-Shot Fine-Tuning for Virtual Metrology: A Framework for Uncertainty-Driven Adaptive Process Control in Semiconductor Manufacturing

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