Assessing the stability of p+ and n+ polysilicon passivating contacts with various capping layers on p-type wafers

发表于 2026-9-11 10:02:13

期刊：Solar Energy Materials and Solar Cells

文献作者：Chukwuka Madumelu; Yalun Cai; Christina Hollemann; Robby Peibst; Bram Hoex; Brett J. Hallam; Anastasia H. Soeriyadi

出版日期：2023-5-

DOI号：10.1016/j.solmat.2023.112245

下载链接：https://www.sciencedirect.com/sc ... 927024823000661/pdf

文献链接：https://doi.org/10.1016/j.solmat.2023.112245

当前文献来源于 Elsevier BV。

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[Elsevier/Sciencedirect] Assessing the stability of p+ and n+ polysilicon passivating contacts with various capping layers on p-type wafers

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